Hot Embossing

EVG, EVG510
PiQuET Laboratory, Lab S4b, ISO6
A versatile wafer bonding system capable of handling substrate sizes ranging from small pieces up to 200 mm.
Max contact force: 10, 20, 60 kN - Single chips processing - Manual loading chamber - Vacuum :Standard: 0.1 mbar - Many thermoplastics can be used for hot embossing, such as PMMA, PC, PE, COC, COP, PS, PVDF, … - High aspect ratios with lateral resolution down to 0,1 µm can be obtained - Highly precise moulding of any structures in polymers, especially microstructures with aggressive aspect ratio (up to 150:1)
We firmly believe that one of the Group’s strengths lies in the transdisciplinary approach that stems from active collaboration between experts from different fields, crucial for achieving results in both research and technological transfer.
RESEARCH ACTIVITIES