This machine has two stainless steel process chambers (PM1 and PM2) host each 3 water cooled cathodes. PM1 chamber is used for the deposition of conductive materials, using a cathode mounting a 3” diameter target and 2 cathodes mounting a 2” target. PM2 chamber has 3 cathodes with 3” targets, and it is used for the deposition of insulating materials. There are mass flow controllers for process gases (Ar:100sccm, N2:50sccm, O2: 100sccm in PM1, 20sccm in PM2). the Load lock could host samples up to 6” diameter, that can be automatically transferred to the PM1 or PM2 (or from one chamber to the other). It's equipped with a 16mc/h oil rotary pump and a 150 l/s turbomolecular pump. The vacuum level is measured by a Full Range sensor (from atmospheric pressure down to 5x10-10mbar)
Materials commonly deposited: Ag/Al/Au/Cu/Ti/Ta/Pt and ZnO - Deposition of insulating materials
